Solecky, Eric P.: search on Z-Library

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1

The roads ahead: Narratives for shared socioeconomic pathways describing world futures in the 21st century

O’Neill, Brian C., Kriegler, Elmar, Ebi, Kristie L., Kemp-Benedict, Eric, Riahi, Keywan, Rothman, Dale S., van Ruijven, Bas J., van Vuuren, Detlef P., Birkmann, Joern, Kok, Kasper, Levy, Marc, Solecki

Journal:

Global Environmental Change

Year:

2015

Language:

english

File:

PDF, 883 KB

english, 2015

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - In-line E-beam metrology and defect inspection: industry reflections, hybrid E-beam opportunities, recommendations and predictions

Sanchez, Martha I., Ukraintsev, Vladimir A., Solecky, Eric, Rasafar, Allen, Cantone, Jason, Bunday, Benjamin, Vaid, Alok, Patterson, Oliver, Stamper, Andrew, Wu, Kevin, Buengener, Ralf, Weng, Weihao,

Year:

2017

Language:

english

File:

PDF, 1.52 MB

english, 2017

3

Time-dependent electron-beam-induced photoresist shrinkage effects

Bunday, Benjamin, Cordes, Aaron, Hartig, Carsten, Allgair, John, Vaid, Alok, Solecky, Eric, Rana, Narender

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2012

Language:

english

File:

PDF, 3.43 MB

english, 2012

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Metrology capabilities and needs for 7nm and 5nm logic nodes

Sanchez, Martha I., Ukraintsev, Vladimir A., Bunday, Benjamin, Solecky, Eric, Vaid, Alok, Bello, A. F., Dai, Xintuo

Year:

2017

Language:

english

File:

PDF, 8.57 MB

english, 2017

5

[IEEE 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2017.5.15-2017.5.18)] 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Metrology manufacturing control factors: A holistic approach for supporting 14nm and 7nm

Jayez, David, Vaid, Alok, Solecky, Eric, Lenahan, Michael, Dixit, Dhairya, Largo, Charles, Vakas, Georgios, Seipp, Steve

Year:

2017

Language:

english

File:

PDF, 429 KB

english, 2017

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Tool-to-tool matching issues due to photoresist shrinkage effects

Raymond, Christopher J., Bunday, Benjamin, Cordes, Aaron, Hartig, Carsten, Allgair, John, Vaid, Alok, Solecky, Eric, Rana, Narender

Year:

2011

Language:

english

File:

PDF, 5.78 MB

english, 2011

7

Special Section Guest Editorial: Holistic/Hybrid Metrology

Vaid, Alok, Solecky, Eric

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2014

Language:

english

File:

PDF, 425 KB

english, 2014

8

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Characterizing and understanding stray tilt: the next major contributor to CD SEM tool matching

Solecky, Eric P., Herr, Daniel J., Archie, Charles N., Mayer, Jason, Cornell, Roger S., Adan, Ofer

Year:

2003

Language:

english

File:

PDF, 171 KB

english, 2003

9

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Automated CD SEM tilt-ready for primetime: a fast in-line methodology for differentiating lines vs. spaces

Solecky, Eric, Silver, Richard M., Chin, Kay, Qu, Gongyuan, Yang, Hedong, Lorusso, Gian, Azordegan, Amir

Year:

2005

Language:

english

File:

PDF, 436 KB

english, 2005

10

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Image processing for SEMs: is this the way to go for CD metrology?

Solecky, Eric P., Archie, Charles N., Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 1.27 MB

english, 1999

11

[IEEE 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2016.5.16-2016.5.19)] 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Reducing metrology mean-time-to-detect by utilizing product data

Crauder, Douglas, Solecky, Eric, Emans, Jason

Year:

2016

Language:

english

File:

PDF, 478 KB

english, 2016

12

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Realizing "value-added" metrology

Bunday, Benjamin, Archie, Chas N., Lipscomb, Pete, Allgair, John, Patel, Dilip, Caldwell, Mark, Solecky, Eric, Archie, Chas, Morningstar, Jennifer, Rice, Bryan J., Singh, Bhanwar, Cain, Jason, Emami,

Year:

2007

Language:

english

File:

PDF, 741 KB

english, 2007

13

Prospects for Resilience || Ecology of Jamaica Bay: History, Status, and Resilience

Sanderson, Eric W., Solecki, William D., Waldman, John R., Parris, Adam S.

Year:

2016

Language:

english

File:

PDF, 5.67 MB

english, 2016

14

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

Banke, Jr., Bill, Silver, Richard M., Archie, Charles N., Sendelbach, Matthew, Robert, Jim, Slinkman, James A., Kaszuba, Phil, Kontra, Rick, DeVries, Mick, Solecky, Eric P.

Year:

2004

Language:

english

File:

PDF, 260 KB

english, 2004

15

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Metrology tool fleet management: a comprehensive discussion of requirements and solutions

Solecky, Eric, Archie, Chas N.

Year:

2006

Language:

english

File:

PDF, 500 KB

english, 2006

16

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Simultaneous critical dimension and overlay measurements on a SEM through target design for inline manufacturing lithography control

Solecky, Eric P., Silver, Richard M., Morillo, Jaime D.

Year:

2004

Language:

english

File:

PDF, 117 KB

english, 2004

17

[IEEE 2006 International Symposium on Semiconductor Manufacturing (ISSM) - Tokyo, Japan (2006.09.25-2006.09.27)] 2006 IEEE International Symposium on Semiconductor Manufacturing - The ROI of Metrology

Bunday, Ben, Allgair, John, Caldwell, Mark, Archie, Chas, Solecky, Eric, Rice, Bryan, Singh, Bhanwar, Emami, Iraj

Year:

2006

Language:

english

File:

PDF, 3.12 MB

english, 2006

18

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Embedded charge investigation: industry concerns and metrology solutions

Solecky, Eric, Archie, Chas N., Vakas, Georgios, Archie, Chas, Adan, Ofer, Dajczman, Asaf., Cornell, Roger, Llanos, Paul

Year:

2006

Language:

english

File:

PDF, 510 KB

english, 2006

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - New techniques in large scale metrology toolset data mining to accelerate integrated chip technology development and increase manufacturing efficiencies

Cain, Jason P., Sanchez, Martha I., Solecky, Eric, Rana, Narender, Minns, Allan, Gustafson, Carol, Lindo, Patrick, Cornell, Roger, Llanos, Paul

Year:

2014

Language:

english

File:

PDF, 689 KB

english, 2014

20

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - Contact holes: a challenge for signal collection efficiency and measurement algorithms

Solecky, Eric P., Archie, Charles N., Jones, Susan K.

Year:

1997

Language:

english

File:

PDF, 770 KB

english, 1997

21

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - New comprehensive metrics and methodology for metrology tool fleet matching

Solecky, Eric, Silver, Richard M., Archie, Chas, Banke, Bill

Year:

2005

Language:

english

File:

PDF, 95 KB

english, 2005

22

Value-Added Metrology

Bunday, Benjamin D., Allgair, John A., Caldwell, Mark, Solecky, Eric P., Archie, Charles N., Rice, Bryan J., Singh, Bhanwar, Cain, Jason P., Emami, Iraj

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2007

Language:

english

File:

PDF, 1.75 MB

english, 2007

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Solving next generation (1x node) metrology challenges using advanced CDSEM capabilities: tilt, high energy and backscatter imaging

Cain, Jason P., Sanchez, Martha I., Zhang, Xiaoxiao, Snow, Patrick W., Vaid, Alok, Solecky, Eric, Zhou, Hua, Ge, Zhenhua, Yasharzade, Shay, Shoval, Ori, Adan, Ofer, Schwarzband, Ishai, Bar-Zvi, Maayan

Year:

2015

Language:

english

File:

PDF, 1.29 MB

english, 2015

24

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Monitoring printing fidelity with image correlation measurements on the CD SEM

Archie, Charles N., Solecky, Eric P., Hayes, Timothy S., Banke, Jr., G. W., Sullivan, Neal T.

Year:

2001

Language:

english

File:

PDF, 570 KB

english, 2001

25

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Practical monitor and control of SEM astigmatism in manufacturing

Dupuis, Sandra R., Hayes, Timothy S., Archie, Charles N., Solecky, Eric P., Sullivan, Neal T.

Year:

2001

Language:

english

File:

PDF, 1.60 MB

english, 2001

26

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Beyond measurement uncertainty: improving the productivity of metrology tools through recipe error analysis

Solecky, Eric, Archie, Chas N., Bennasser, Anas, Weissmann, Erwin

Year:

2007

Language:

english

File:

PDF, 457 KB

english, 2007

27

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - CD-SEM edge width applications and analysis

Solecky, Eric P., Cornell, Roger S., Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 3.72 MB

english, 1999

28

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Improving sub-150-nm lithography and etch CD-SEM correlations to AFM and electrical test

Solecky, Eric P., Mayer, Jason, Archie, Charles N., Herr, Daniel J. C.

Year:

2002

Language:

english

File:

PDF, 832 KB

english, 2002

29

[IEEE 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2016.5.16-2016.5.19)] 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Manufacturing excellence using multi-platform ellipsometry thickness measurement fleet on advanced nodes

Lenahan, Michael, Vaid, Alok, Mahendrakar, Sridhar, Seipp, Steven, Jayez, David, Yueh, Alice, Saxena, Shweta, Solecky, Eric, Gizzi, Samuel, Heller, Amir, Zhang, Tianhao, Song, Da, Yoon, Nam Hee, Camp,

Year:

2016

Language:

english

File:

PDF, 584 KB

english, 2016

30

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - New apparent beam width artifact and measurement methodology for CD-SEM resolution monitoring

Mayer, Jason A., Huizenga, Kylee J., Solecky, Eric P., Archie, Charles N., Banke, Jr., G. W., Cogley, Robert M., Nathan, Claudine, Robert, James M., Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 380 KB

english, 2003

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - CDSEM focus/dose monitor for product applications

Archie, Chas, Solecky, Eric, Rawat, Pawan, Brunner, Timothy, Yoshimoto, Kenji, Cornell, Roger, Adan, Ofer, Raymond, Christopher J.

Year:

2010

Language:

english

File:

PDF, 5.46 MB

english, 2010

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection

Solecky, Eric, Patterson, Oliver D., Stamper, Andrew, McLellan, Erin, Buengener, Ralf, Vaid, Alok, Hartig, Carsten, Bunday, Benjamin, Arceo, Abraham, Cepler, Aron, Starikov, Alexander, Cain, Jason P.

Year:

2013

Language:

english

File:

PDF, 934 KB

english, 2013

33

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Metrology tool fleet management: applying FMP tool matching and monitoring concepts to an overlay fleet

Morningstar, Jennifer, Archie, Chas N., Solecky, Eric, Archie, Chas, Banke, Bill

Year:

2006

Language:

english

File:

PDF, 243 KB

english, 2006

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Monitoring measurement tools: new methods for driving continuous improvements in fleet measurement uncertainty

Solecky, Eric, Allgair, John A., Raymond, Christopher J., Archie, Chas, Sendelbach, Matthew, Fiege, Ron, Zaitz, Mary, Shneyder, Dmitriy, Strocchia-rivera, Carlos, Munoz, Andres, Rangarajan, Srinivasan

Year:

2009

Language:

english

File:

PDF, 535 KB

english, 2009

35

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Three-dimensional top-down metrology: a viable alternative to AFM or cross-section?

Solecky, Eric P., Archie, Charles N., Hayes, Timothy S., Banke, Jr., G. W., Cornell, Roger S., Sullivan, Neal T.

Year:

2001

Language:

english

File:

PDF, 1.06 MB

english, 2001

36

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Phase-shift focus monitor applications to lithography tool control

Wheeler, Donald C., Solecky, Eric P., Dinh, T., Mih, Rebecca D., Fuller, Gene E.

Year:

1997

Language:

english

File:

PDF, 668 KB

english, 1997

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